A Modified Structure Zone Model to Describe Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

The morphological evolution of ZnO thin films deposited by magnetron sputtering is described by the use of a structure zone model. A modified Structure Zone Model was revealed, in which the boundaries between zones with specific features are shifted towards lower homologous temperatures (T/T sub m) than in the classical models. The range of homologous temperatures for this study were in the range of 0.13 T/T sub m 0.43. The promotion of formation of "high temperature" structures at relatively low temperature is a consequence of the energetic species generated during the sputtering process which bombard the growing film.