Chemical Beam Epitaxy.

This is to be published as a chapter in a book volume by Academic Press, "Beam Processing Technologies" edited by N.G. Einspruch, S.S. Cohen and R.N. Singh. The table of contents are as follows: I. INTRODUCTION. II. CBE SYSTEM DESIGN 1. General System Consideration, 2. Group V Sources and Cells, 3. Group III Sources and Cells, 4. Gas Handling of Group V Hydrides, 5. Gas Handling of Group III and Group V Metalorganics, 6. Epilayer Uniformly and Multi- Wafer Scale-Up. III. SUBSTRATE PREPARATION FOR GROWTH. IV. GROWTH KINETICS OF CBE. 7. General Discussion, 8. Growth Kinetics Studied Using RHEED Intensity Oscillations.