CMOS-Based MEMS Mirror Driver for Maskless Lithography Systems
16 September 2007
A 512x128 CMOS MEMS mirror control array for maskless lithography systems is implemented in a standard 0.35um CMOS process. The CMOS driver also includes two parallel 8-b DACs to write a mulilevel data into memory cells. To verify its functionality, a prototype test chip is designed with a self-calibration technique to compensate the cell leakage.
