Compressed fluid technology: Application to RIE-Developed resists.

Compressed carbon dioxide in both its liquid and supercritical fluid states was used to extract 1micron thick glassy and rubbery films of nonvolatile monomeric and oligomeric siloxane compounds dissolved in a polymeric host. These were used in a plasma or reactive ion etching developed (PDR) multilevel lithographic scheme. A processing window was investigated and defined to eliminate extraction-induced crazing effects. Crazing was usually avoided by using supercritical CO2 rather than liquid CO2 provided that film thicknesses were