Crystallization and phase formation in Ti/Si thin film superlattices.
07 October 1986
The crystallization of Ti and the temperature of TiSi sub 2 phase formation in Ti/Si superlattices has been established using in situ annealing X-ray diffraction in the temperature range 100 - 900C. It was observed that the formation temperature of the C49 - TiSi sub 2 phase decreases with decreasing Ti layer thickness, while the transformation temperature from the C49 - TiSi sub 2 phase to the C54 - TiSi sub 2 phase increases and becomes as high as ~ 800C for very thin Ti layers could be explained in terms of the morphology of the C49 phase growing in the superlattice.