Device Photolithography: Electron-Sensitive Materials

An electron beam pattern generator developed at the Western Electric Engineering Research Center requires novel recording systems that possess high resolution, high sensitivity at short exposure times, flat surfaces, and a conductive underlay. 1 Silver halide emulsions are best suited for the generation of reticles by this generator, while for the production of one-to-one masks or the generation of patterns directly onto silicon slices (thereby avoiding the use of masks) photoresists are the preferred recording media. High-resolution emulsions and photoresists were chosen over other recording media since they offer the best combination of sensitivity and resolution. 2-15 (See Table I.) Systems using these two recording media are discussed in this paper.