Distortion corrections for an electron beam exposure system: EBES IV.
03 October 1983
This report outlines techniques for correcting beam positioning errors caused by imperfections in the stage system or height variations of the writing surface for EBES IV. The corrections use a first-order 2-dimensional spline fit over the machine writing area (which is broken up into an array of rectangular grids). This report covers the choice of grids in addition to the range and precision of fitted coefficients.