Electron-beam resist summary.

Numerous electron-beam resist systems are either commercially available or have been reported in the literature. This document represents a summary of the chemistry and properties of those materials that are readily available and those that are suspected of being in use by our competitors. The information presented includes the chemical name and structure for each resist, in addition to the resist trade name. A schematic representation of the radiation chemistry each material undergoes is also included. Resist process and lithographic characteristics are outlined to facilitate the evaluation of process complexity, sensitivity and resolution capability, and dry etching resistance. This summary is intended to assist in the evaluation of the merits of one resist vs. another for e-beam direct-write or photomask applications.