Design and Implementation of a Plasma Area Information System
01 January 1989
Understanding and controlling complex semiconductor process steps requires very detailed process data and the ability to use the data effectively. By associating related processing machines into a logical cell, detailed data can be gathered at given steps and maintained in a local database for correlation and control without burdening the factory control system. A plasma etching cell has been created which integrates data collection, data reporting, and lot verification and works in conjunction with the factory system. Operator workload is reduced, potential misprocessing is eliminated, and a database rich in processing and machine information is created.