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Inspecting, Challenging and Calibrating Toxic Gas Monitors

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A crucial facet of semi-conductor material processing is the inclusion of Group III and Group V elements into the substrate material silicon (Group IV). The processes by which this is accomplished are a variety of chemical-vapor or molecular-beam epitaxy operations. Thus gases or vapors of Group III and Group V compounds are required. Some processes use just the chlorides but most use the chlorides with the hydrides or just the hydrides alone.