Optimal Developer Selection for Negative Acting Resists

A methodology for determining the optimal single component developer/rinse pair for a negative acting resist is described. This method is applicable to any resist basing its negative action on crosslinking and development in organic based solvents. Within the method, initial developer/rinse candidates are identified by utilizing the Hansen 3-dimensional solubility parameter model. This model provides a thermodynamic solubility picture of the resist, and determines those developers which will only minimally contribute towards swelling of defined features. Developer/rinse pairs are subsequently evaluated for acceptable resist dissolution kinetics, and compatibility with existing spray development processes.