The growth and characterization of epitaxial fluoride films on semiconductors.
01 January 1983
This review considers the growth and characterization of epitaxial alkaline earth fluoride compounds on semiconductors. The field has developed quite rapidly in recent years, from the original demonstration of epitaxial growth in these systems to the investigation of the structure and properties of the layers. Two recent developments are reviewed in detail: the epitaxial relations which have been discovered between fluoride films and semiconductor substrates and the variety of interface structures which these systems display.