The Preparation of Optical Waveguide Preforms by Plasma Deposition
01 January 1978
The modified chemical vapor deposition (MCVD) process1 has achieved acceptance as a means of preparing low-loss optical waveguides. A recent study of the preparation of silica-clad germania borosilicate optical fibers by this process2 indicates that it can provide low-loss optical fibers having properties which surpass minimum requirements for wide-band communications applications. Typical fibers produced by M C V D are characterized by low loss (