The Thermochemistry, Toxicity and Growth Properties of Alkylarsine Alternative Sources
08 October 1989
Current CVD techniques for III/V semiconductor thin films (OMVPE, Hydride VPE and Gas-source MBE) uses arsine and phosphine as Group-V reactants. However, both these hydrides are extremely toxic, high pressure gases. To develop a safer semiconductor process we have investigated organoarsenic compounds as alternatives to arsine since they have the advantage of being low vapor pressure liquids; e.g., typically, Pvap