Evaluation of the Proximity Effect and GHOST Correction Technique for Submicron Electron Beam Lithography at 50 and 20 kV
01 January 1988
The magnitude of proximity effect has been experimentally quantified using an electrical proximity effect tester (PET). The PET was delineated in MP 2400-17 resist on a trilevel stack on aluminum, using an AT&T electron beam exposure system. At 50kV the linewidth variation due to proximity exposure was measured to be greater than 0.1micron at a spacing between features of 7.0microns, and the effective range of the electrons was measured to be greater than 10microns.