Fabrication of two-dimensional InP photonic band-gap structures using inductively coupled plasma etching
01 January 2002
A fabrication process of two-dimensional photonic crystals has been developed. Such a process consists of electron beam lithography, reactive ion etching of an intermediate dielectric layer and the etching of InP with inductively coupled plasma. Photonic crystal patterns such as waveguide Fabry-Perot cavities have been fabricated on InP based epitaxial structures. A depth to diameter ratio as high as 14 has been obtained for hole diameter varying from 200 nm to 240 nm. Optical characterisation of these fabricated photonic crystals showed excellent results.