HIPOX Oxidation for Waveguide Applications

Thick oxides in the 10-15micro range are needed for fabrication of lightwave devices for use in `waveguide Telecommunication Applications`. High pressure oxidation (HIPOX) is the most suitable tool for growing these oxides. In this paper we discuss a procedure that optimizes the oxidation process parameters. This has resulted in a reasonably uniform thick oxide which has allowed further investigation and fabrication of the `lightwave devices`.