In Situ Plasma-Surface Diagnostics

Plasma processing is used routinely to modify surfaces; for example in etching, deposition, and passivation. Monitoring these surface changes in situ in real time is important both for understanding basic plasma chemistry and developing and controlling device processing. Several in situ plasma-surface monitoring techniques will be discussed with particular emphasis on photoemission optogalvanic spectroscopy, photoluminescence, and surface second harmonic generation.