Lithographic evaluation and processing of chlorinated polymethylstyrene.

Chlorinated polymethylstyrene has been shown to behave as a negative resist upon electron beam exposure. Polymethylstyrene was prepared by both anionic and free radical techniques and chlorinated to produce a series of polymers with a range from 0 to 2.5 chlorine atoms per polymer repeat unit (0 to 42.5 wt %chlorine).