Lithographic Results of Electron Beam Photoresists Prepared by Living Free Radical Polymerization

A new family of random copolymers composed of chloromethylstyrene and a silicon based styrenic monomer was prepared using living radical polymerization. The lithographic efficiency of the resulting electron beam resists was examined. A pronounced improvement on the lithographic resolution and image quality of resists with a narrow molecular mass distribution was observed and is described.