Local atomic structure from a clean surface: Amorphized Si.
01 January 1985
The first application of near-edge/surface -extended x-ray adsorption fine structure to the study of a clean surface is reported. Direct evidence is found for surface recrystallization of ion-damaged (amorphized) Si, whereas no such evidence is seen for evaporated (amorphous) Si. The procedures described here are applicable to almost all clean or adsorbate-covered surfaces.