Low Voltage 0.1microns Organic Transistors and Complementary Inverter Circuits Fabricated With a Low Cost Form of Near Field Photolithography

This letter describes the combined use of a form of near field photolithography based on conformable phase masks, microcontact printing and shadow masking for low cost fabrication of organic transistors and simple complementary inverter circuits with critical dimensions of ~0.1microns. The good performance of the devices and their low voltage operation make them and the fabrication procedures potentially attractive for many applications.