LPCVD of BP-TEOS.

The process and equipment have been described for the deposition of a bororphosphosilicate glass using organic compounds as reactants. In this memo, The properties of the deposit (BP- TEOS) and the dependence of film composition on reactant flow rates and temperature are presented. The dependence of the index of refraction on phosphorus concentration and the extent of viscous flow on the boron and phosphorus concentration is detailed. A discussion of the conditions for formation of two microstructural defects is presented.