Molecular Beam Epitaxy

09 June 1986

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Molecular Beam Epitaxy (MBE) is a thin film crystal growth technique by a process involving the reaction of one or more thermal molecular beams with a crystalline substrate surface under ultra-high vacuum conditions. This talk will briefly touch the highlights of "bandstructure engineering" and the device applications and results that have been realized with particular emphasis on the III-V compound semiconductors.