Progress on the Realization of the Electron Column Modules for Scalpel High-Throughput/Alpha Electron Projection Lithography Tools

Electron projection lithography (EPL) is one of the most promising candidates for next generation lithography (NGL). In this paper, we report on the realization of the electron column modules for the SCAPEL High-Throughput/Alpha Electron Projection Lithography Tools, designed to demonstrate high wafer throughput at resolutions at and below 100 nm. For the illumination and projection systems we have opted for a highly modular set-up of each electron optical component to achieve maximum flexibility and facilitate a fast and smooth evolution towards higher throughput and resolution. A crucial point for the overall tool performance is the timely availability of system alignment and metrology strategies. Here we adapt state- of- the-art techniques from light optical lens manufacturing to a maximum amount. During the whole tool development strict design and process rules are applied which will allow an easy transition of all engineering and manufacturing processes for high-volume column production.