Si and Si-Based Heteroepitaxial Structures Grown by Rapid Thermal Chemical Vapor Deposition (RTCVD)
23 February 1990
CVD is well established deposition technology that is firmly embedded in the integrated processing line. Because CVD is a production worthy technology, there are advantages in using it to deposit state-of- the- art Si and Si heterostructural films. The requirements for such films are, among others, that they be thin (