Nanofabrication Using Inorganic Resists

Nanometer structures can be directly produced in certain inorganic resists using a high current density nanometer sized electron probe. Holes and lines can be cut and areas of metal can be formed directly in the resist. Results are presented demonstrating high resolution lithography, using a STEM, in an amorphous AlF sub 3 resist on a thin substrate. For example, 7 nm lines with a 17 nm pitch (see figure), and 15 nm width metallic strips have been produced. Nanometer lithography on bulk substrates, using a field emission source SEM, is also considered. Applications suitable for high resolution inorganic resists are discussed.