Nanolithography on solid substrates.

This paper examines, by means of a Monte Carlo simulation, the conditions under which electron beam lithography could be used to produce nanometer scale structures on a solid substrate. The simulation shows that, for a high incident beam energy (in excess of 30 keV) and a small diameter probe (less than 100 A), the energy deposited in a thin resist layer (below 2000 A in thickness) is strongly localized in the vicinity of the incident probe point because of the contribution from the fast secondary electrons generated in the resist by the incident beam.