Nucleation considerations in the wavelength dependent activation selectivity of aluminum chemical vapor deposition.
01 January 1987
This manuscript is a summary abstract, to be published in the Journal of Vacuum Science and Technology, of a presentation given at the Microphysics of Beams and Surface Adsorbates Meeting of the AVS/OSA in Santa Fe, NM on February 16-18, 1987. It summarizes our current understanding of the nucleation phenomena encountered in laser activation of Al chemical vapor deposition.