On the Mechanism of Plasma Enhanced Dielectric Deposition Charging Damage
01 January 2000
The photoconduction is shown to be the mechanism for plasma charging damage during plasma enhanced dielectric deposition. Details of the conduction process, including polarity effect are explained. The recently measured oxide photoconductivity is shown to be in agreement with expectation. The main cause of severe charging damage is the low level of photoconduction coupled with high processing temperature.