Optimal developer selection for the negative resist poly(glycidyl methacrylate-co-3-chlorostyrene).
01 January 1988
The Hansen 3-dimensional solubility parameter model is used to determine the optimal developer/rinse system for the negative resist poly(glycidyl methacrylate-co-3-chlorostyrene). The single component developer/rinse combination, n-butyl acetate/n- hexyl acetate, minimizes swelling of the defined images and is compatible with spray development processes. This process requires additional criteria on the developer such as low volatility rendering it insensitive to relative humidity changes. In addition, the electron beam resolution capability of this resist was improved with respect to the conventional methylethyl ketone/ethanol developer mixture. This model is general and can be applied to any resist basing its negative action on crosslinking and development in organic based solvents.