Optimization of DUV Chemically Amplified Resist Platforms for SCALPEL E-Beam Exposure

Optimization of phenolic chemically amplified resist platforms has lead to the development of new resists, capable of high throughput SCALPEL exposure. A positive resist, XP9947A, has exhibited 100 nm and 80 nm dense line resolution with good sensitivity and dose latitude. The influence of DUV absorption and 100 KV e-beam absorption to the optimization process is discussed. The nature of 100 KV e-beam absorption enables a greater freedom of resist design than encountered for DUV resists.