Passivation of GaAs using (Ga2O3)(1-x)(Gd2O3)(x), 0 <= x <= 1.0 films

The Ga2O3(Gd2O3) dielectric film was previously discovered to passivate the GaAs surface effectively. We have investigated the systematic dependence of the dielectric properties of (Ga2O3)(1-x)(Gd2O3)(x) on the Gd (x) content. Our results show that pure Ga2O3 does not passivate GaAs. Films with x greater than or equal to 14% are electrically insulating with low leakage current and high electrical breakdown strength. Furthermore, a low interfacial density of states was attained in films with x greater than or equal to 14%. The results show the important role of Gd2O3 in the (Ga2O3)(1-x)(Gd2O3)(x) dielectric films for effective passivation of GaAs. (C) 1999 American Institute of Physics. {[}S0003-6951(99)04434-4].