Photosensitivity locking technique applied to UV written planar Bragg gratings
20 March 2003
A technique is presented for thermally processing deuterium loaded silica-on-silicon samples to provide an enhanced photosensitivity lifetime of at least one year at room temperature. Subsequent simultaneous writing of channel waveguides and Bragg gratings resulted in grating reflections of similar to80% with a FWHM of 0.1 nm.