Radiation Damage Effects in Boron Nitride Mask Membranes Subjected to X-Ray Exposures

The effects of radiation damage with 1 to 3 keV x-rays on hydrogenated boron nitride films prepared by LPCVD have been investigated. It is shown that both the surface and bulk film properties of these materials can be modified and can potentially limit the use of this material as a membrane in an x-ray mask structure.