Sample for Electron Beam Detection and Alignment

Electron beams are frequently used for charge neutralization of insulators. The alignment of the electron beam can be difficult because the electron beam impact area may not be observed. Analysis of copper implanted into a wide range of materials showed that a layer of copper implanted silicon dioxide provided an exceptionally clear view of the electron beam impact region in the form of a blue glow. Data presented are for a CAMECA IMS-6F. Variations of the secondary ion magnetic sector analyzer magnetic filed for different masses can be easily distinguished. The light intensity scales with the dose of copper implanted into the sample and has provided a mechanism of copper detection in semiconductor structure. The addition of other implants into the same silicon oxide layer reduces the electron beam detection. A mechanism for the light emission is proposed.