Synthesis and Oxygen Reactive Ion Etching of Novel Siloxane Block Copolymers.
01 January 1989
The coupling reaction between dimethylamine terminated poly (dimethyl siloxane), (PDMSX), oligomers, and the phenolic hydroxyl groups of novolac resins results in block copolymer systems. The charge ratio of PDMSX oligomers controls the silicon content and this determines the solubility and O sub 2 Reactive Ion Etching (RIE) resistance of the final material.