Tenth micron lithography with a 10 Hz 37.2 nm sodium laser.

A l mJ 37.2 nm inner-shell photoionization-pumped sodium laser operating at 10 Hz is proposed as a source for doing soft-x- ray lithography at a resolution of 0.1micron. Submicron lithography is essential for taking full advantage of the high-speed capabilities of gallium arsenide microelectronic circuitry. The laser could be used in conjunction with a projection lithography system that includes a transmission or a reflection mask, a multi- layer coated annular field optical system, and a tri-level resist. The entire system would be relatively compact and should be capable of a commercially significant throughput. The availability of a collimated beam at 37.2 nm would also allow testing of optics in this region.