The Use of Photoadditives in 248 nm and 193 nm Chemically Amplified Resists: A Retrospective of Work Done at Bell Laboratories
21 March 1999
A retrospective will be given of work done at Bell Laboratories on photoadditives compounds for use in single layer chemically amplified resists imageable with 248 nm or 193 nm radiation. The topics of discussion will include the use of photoacid generators (PAGs) both onium salt and 2-nitrobenzyl types for and also a discussion of the utility of photodecomposable aminosulfonate bases.