An electron beam pattern generator developed at the Western Electric Engineering Research Center requires novel recording systems that possess high resolution, high sensitivity at short exposure ti
There are two classes of photographic mask-making systems.
The 3.5X and 1.4X reduction cameras basically employ the same structural features differing only in the lenses and focal distances required to achieve the desired reductions.
This paper and the paper immediately following describe the two reduction cameras which have been developed to serve as part of the photolithographic mask-making facility described in this issue.
The demand for integrated circuits is increasing rapidly, and projections indicate that the existing mask-making facilities will be severely overloaded in the near future.
A computer-based information and control system, referred to as the Mask Shop Information System (MSIS), assists in running the Bell Telephone Laboratories mask-making facilities at Murray Hill, Ne
The basic design concept of the primary pattern generator (PPG) is the production of a linearly scanning, small, constant-size light spot.
The Primary Pattern Generator Introduction By K. M.
The primary pattern generator (PPG) is an electromechanical light-scanning system with an unusual combination of speed and accuracy.
The primary pattern generator (PPG) writing-control system has two main functions: (i) interpret the commands generated by the XYMASK PPG postprocessor, and generate from these commands a bitby-bit
