Publications

Process programming is a critical approach in many process management related areas including workflow management, software engineering, etc.

The progress of silicon process technology provides continual challenges for the development and refinement of process models.

A trilevel resist process for 0.5-micron e-beam lithography using AZ-2415/AZ-2400-17 as the imaging resist and the GHOST sup 7 proximity correction technique was developed.

Direct write e-beam lithography in chemically amplified resists is capable of very high resolution (40 nm), however, the throughput of direct write approaches have limited their use to the manufact

We have compared the properties of gels prepared from fine SiO sub 2 powders with those from re-dispersed pulverized gel powders.

NPR (Novolac Positive Resist), a high resolution (0.25microns) positive electron beam resist, is a blend of a cresol novolac and a polymeric dissolution inhibitor, poly(2-methyl-1-pentene sulfone)

AT&T has developed guidelines to help managers in the "white collar" areas improve quality and productivity.

Ceramic processing of YB sub 2 Cu sub 3 O sub (x)-based superconductors and process related problems are described.

Since the discovery of superconductivity in the Ba-Y-Cu-O system about a year ago, and more recently in the Bi-Sr-Ca-Cu-O system, it has been a challenge to understand and improve the transport pro

A class of organosilicate has been developed that can reach ultra low-dielectric constant (k=2).