Fabrication of metal-epitaxial insulator-semiconductor field effect transistors (MEISFETs) by molecular beam epitaxial growth of CaF2 on Si is reported for the first time.
This paper reports results from the first successful fabrication of MOS devices with extreme ultraviolet lithography (EUVL).
The incorporation of dopants and impurities in the fabrication of optical glass fibers is determined by a complex interaction of phenomena.
We demonstrate the formation, in a single process step, of periodic arrays of features of surface relief with submicrometer lateral dimensions in hybrid organic and inorganic solgel glasses by usin
We use a two-photon laser-scanning microscope to fabricate two-dimensional (2D) photonic crystal structures in commercially available SU-8 polymer films, and successfully demonstrate making nanostr
This memorandum describes the in-place fabrication of linear and rotary polysilicon micromechanical structures, using surface micromachining techniques.
In this work, colloidal suspensions are used as a precursor to the formation of layers of optical quality glass on silicon substrates.
A number of the fiber fabrication methods have evolved in response to the interest in active fiber devices based on rare earth doped core silicate fiber.
We have developed a fabrication procedure for reduced area InP/InGaAs based HBT and DHBT devices using a process involving both wet chemical and ICP plasma etching.
We have developed a robust fabrication procedure for reduced area InP based HBT's, using a process involving both wet etching and ECR plasma etching.
